RSG50 RF power supply Introduction: As a power source for RF-driven plasma systems, it can be used in the semiconductor industry, including: etching, RIE, parallel plate, ICP, RF sputtering, CVD and PVC systems, plasma cleaning, PECVD, lath RF laser source, medical beauty It can also be used as a power supply for induction heating and dielectric heating equipment in industrial systems. Features: 1. Solid state design makes the power supply have the advantages of long life and low maintenance cost 2. "AB" class amplifier design ensures the stability of the power supply 3. Control circuit that can guarantee product consistency under high standing wave ratio operating conditions 4. Wide-band, low-Q cable design suppresses self-oscillation and fluctuation 5. Forward and reverse power LED display 6. Manual power adjustment and external analog control 7. DC24V external power supply 8. Forced air cooling 9. Overall efficiency ≥72% (at 50W output) Technical Parameters: Frequency stability: ≤± 0.005% Power stability: ≤±0.5% Withstand standing wave ratio: VSWR ≤2 Harmonic output: second harmonic is lower than -40dBc, third and higher harmonics are lower than -50dBc Noise output: less than -40dBc Ambient temperature: 0~45 ℃ (without condensation) Relative humidity: <85% RF power protection: Overheat protection, standing wave protection, overvoltage protection, overcurrent protection Cabinet size: 208*105*198 mm (width. height. depth) Weight: 1.5 kg
Introduction: As a power source for RF-driven plasma systems, it can be used in the semiconductor industry, including: etching, RIE, parallel plate, ICP, RF sputtering, CVD and PVC systems, plasma cleaning, PECVD, lath RF laser source, medical beauty It can also be used as a power supply for induction heating and dielectric heating equipment in industrial systems.
