RSG150P RF Power Matching Device Integrated Machine Introduction: As the power supply for RF driven plasma system, it can be used in semiconductor industry, including etching, RIE, parallel plate, ICP, RF sputtering, CVD and PVC systems, plasma cleaning, PECVD, Flat noodles RF laser source, medical beauty, and also as the power supply for sensing heating and dielectric heating equipment in industrial systems. Features: 1. Solid state design enables the power supply to have advantages such as long lifespan and low maintenance costs 2. The "AB" class amplifier design ensures the stability of power supply operation 3. Control circuit that can ensure product consistency under high standing wave ratio conditions 4. The design of broadband and low Q-value cables suppresses self-excited oscillations and fluctuations Technical parameters: Output power: 5-150 watts, continuously adjustable Optional frequency: 1.2MHz~150MHz, any fixed frequency Frequency stability: ≤ ± 0.005% Power stability: ≤ ± 0.5% Withstand standing wave ratio: VSWR ≤ 2.0 Harmonic output: Second harmonic below -40dBc, third and higher harmonic below -50dBc Noise output: below -40dBc Environmental temperature: 0-45 ℃ (without condensation) Relative humidity: ＜ 85% Weight: 5.5kg
Introduction: As the power supply for RF driven plasma system, it can be used in semiconductor industry, including etching, RIE, parallel plate, ICP, RF sputtering, CVD and PVC systems, plasma cleaning, PECVD, Flat noodles RF laser source, medical beauty, and also as the power supply for sensing heating and dielectric heating equipment in industrial systems.
