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RF200W radio frequency power network integrated machine

Product ID:OtherRFdy028

Price: Please inquire PDF Format
Supply Ability:50 SETS/MON
Port:SHENZHEN
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  • Product Introduction
  • Consulting
  • Model NumberRF200W
    Brand NameCHANGCHUNXINGDA
    Payment TermsTT,PAYPAL
    Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
    Technical parameter:
    Output power: 200W continuously adjustable
    Signal form: continuous wave, pulse modulation can be added
    Matching output impedance: (2.7~45) Ωj (0~70) Ω
    Output signal frequency: 13.56MHz ±0.005%
    Power stability: ≤ ± 0.5%
    Harmonic output: ≤ -50dB
    Ambient temperature: -40 ~ +40
    Relative humidity: <85%
    Cooling method: forced air cooling
    Power supply: 220V ±15V, 50Hz/60Hz single-phase AC
    Output interface: SL-16 standard coaxial connector
    Machine efficiency: ≥ 75%
    Control mode: manual control
    Protection circuit: overcurrent protection, standing wave protection, overheating protection
    Display: forward and reverse output power indicator meter display;
    Chassis size: 430*320*120mm (horizontal); 240*205*315mm (vertical)
    Panel size: 484*130mm (horizontal); 250*210mm (vertical)
    Net weight: 6.4KG
  • Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
     
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