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RF-500W radio frequency power supply for Vacuum field

Product ID:OtherRFdy029

Price: Please inquire PDF Format
Supply Ability:50 SETS/MON
Port:SHENZHEN
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  • Product Introduction
  • Consulting
  • Model NumberRF-500W
    Brand NameCHANGCHUNXINGDA
    Payment TermsTT,PAYPAL
    RF-500W radio frequency power supply

    Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
    Technical parameter:
    Frequency: 2MHZ, 3MHZ, 7MHZ, 13.56 MHz, 27.12 MHz, 40.68MHz, 81.36 MHz, 100 MHz, (or other frequencies)
    Forward and reverse power indicator display
    Manual power adjustment or computer external control power adjustment
    Output power: 0500W continuously adjustable
    Maximum reflection: 40W
    Output impedance: 50 ohms
    Power stability: 500W±0.5%
    Overall efficiency: ≥75% (when 500W output, 50Ω load)
    Output waveform: standard sine wave
    Signal output mode: continuous
    Ambient temperature: -4040
    Relative humidity: <90%
    Cooling method: forced air cooling
    Power supply mode: AC/220 AC power supply
    Output connection: N-type coaxial connector box
    Body size: width 440 height 85 depth 380mm panel 484*90 mm
    Matching network: width 270 height 105 depth 230mm

  • Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
     
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