Introduction: PT-2S vacuum plasma cleaning machine uses energy conversion technology to convert gas into highly active gas plasma under a certain vacuum negative pressure condition. The gas plasma can gently scour the surface of solid samples and cause molecular structure. In order to achieve super-cleaning of organic contaminants on the sample surface, the organic contaminants are completely removed by an external vacuum pump in a very short time, and the cleaning capability can reach molecular level. Under certain conditions, the surface characteristics of the sample can also be changed. Because gas is used as a medium for cleaning treatment, recontamination of the sample can be effectively avoided. The plasma cleaner not only enhances the adhesion, compatibility, and wettability of the sample, but also sterilizes and sterilizes the sample. Plasma cleaners are now widely used in optics, optoelectronics, electronics, materials science, polymer, biomedical, microfluidics and other fields. The domestic plasma cleaning machine is based on the disadvantages of expensive and difficult to popularize foreign plasma cleaning machines, and it draws on the advantages of existing domestic and international plasma cleaning machines, and combines the needs of domestic users, using advanced technology to develop new series of plasmas. washing machine. In addition to the advantages of other plasma cleaners, this product has the advantages of stable performance, high cost performance, high cleaning efficiency, easy operation, low use cost, and easy maintenance. The product can adapt to different users' special requirements for the equipment. The cleaning tank is made of heat-resistant glass and stainless steel. The stainless steel washing tank is available in round and square shapes. Technical Parameters: Stainless steel cabin: Φ100mm×270mm Capacity: 2 liters Power supply: AC220V Working current: The whole working current is less than 1.2A (without vacuum pump) RF power supply: 0-150W/0-300W (select one before delivery) RF frequency: 40KHz or 13.56MHz optional (offset less than 0.2KHz) Frequency offset: less than 0.2KHz Characteristic impedance: 50 ohms, automatic matching Vacuum degree: 10Pa-1000Pa Gas flow: 60-600ml/min (adjustable) Process Control: MCU Automatic and Manual Methods Cleaning time: 1-100 minutes adjustable Power size 10%-100% adjustable Dimensions: PT-2S type _400x450x250 Weight: 36.5Kg Vacuum pump: 2XZ-4 Vacuum chamber temperature: less than 65°C Cooling method: forced air cooling
