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JG-3KW-F radio frequency plasma power supply for Induction heating

Product ID:OtherRFdy030

US$0.00 ~ US$1.00 PDF Format
Supply Ability:50 SETS/MON
Port:SHENZHEN
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  • Product Introduction
  • Consulting
  • Model NumberJG-3KW-F
    Brand NameCHANGCHUNXINGDA
    Payment TermsTT,PAYPAL
    JG-3KW-F radio frequency plasma power supply

    Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
    technical parameter:
    Output power 0-3kw continuously adjustable
    Output frequency: 13.56MHZ (output frequency 2MHZ-40.68MHZ single customized)
    Output impedance matching range: (2.7-75)Ω j(070)Ω
    Frequency stability: ≤1.0×106 (20. C)
    Power supply mode: 3800V AC three-phase four-wire
    Cooling method: forced air cooling
    When the power consumption is at full power output: ≤4.5KW
    Continuous working time: 8 hours
    With the function of manually adjusting network parameters to achieve matching
    This power supply: equipped with a microcomputer external control interface
    Cabinet size: width 600 high 1500 deep 600mm
    Matching network: Width: 440 high 120 deep 340 panel 484X140mm
  • Introduction
    The high-frequency plasma power source produced by our factory is widely used in scientific research and industry such as plasma modification, polymerization, analysis, PCVD, vapor deposition, magnetron sputtering film, plasma surface treatment, and low-temperature plasma medical disinfection and sterilization in the vacuum chamber. field. Mainly for domestic universities, colleges, research institutes, vacuum coating, photovoltaic, medical, and optoelectronic high-tech enterprises. And exported abroad. Deeply trusted by the majority of users.
    Our factory takes the customer as the center, providing customers with high-quality, supporting and reliable instruments and perfect service tenet. And continue to develop a series of products such as radio frequency plasma power supply, automatic matching device, DC sputtering power supply, negative pulse power supply, film thickness monitor and so on. Constantly develop, keep making progress, and actively follow the world's advanced technology trends. It can meet the needs of customers as much as possible, and provide comprehensive, high-quality and fast services.
     
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