| Industry | Applications |
| Semiconductor Industry | Wafer coating and thin film thickness measurement |
| Optical Coatings | Lens coatings, anti-reflection films, protective coatings |
| Electronics | Functional films and dielectric layer analysis |
| Solar Industry | Thin film photovoltaic material testing |
| Materials Research | New film material development |
| Chemical Industry | Polymer films and organic coating measurement |
| Surface Engineering | Metal coating and protective layer inspection |
| Laboratory Research | Thin film optical property analysis |
| Parameter | Specification |
| Model | SR-C Reflective Film Thickness Meter |
| Measurement Function | Reflectance and related optical parameters |
| Measurement Principle | Optical interference spectroscopy |
| Spectral Range | 380–800nm / 650–1100nm (customizable) |
| Film Thickness Range | 50nm–40μm |
| Single Measurement Time | ≤1s |
| Repeatability Accuracy | 0.1nm (100nm SiO₂ wafer, 30 measurements) |
| Absolute Accuracy | ±1nm or 1% (film thickness dependent) |
| Spot Size | 0.5–3mm |
| Incident Angle | Vertical incidence |
| Film Analysis Capability | Single-layer and multilayer films |
| Light Source | High-intensity halogen lamp |
| Measurement Type | Non-contact, non-destructive |
| Feature | SR-C Optical Film Thickness Meter | Traditional Thickness Measurement Methods |
| Measurement Method | Optical interference spectroscopy | Mechanical or contact measurement |
| Sample Damage | Non-contact, non-destructive | Possible surface damage |
| Measurement Speed | ≤1 second | Usually slower |
| Film Structure Analysis | Single and multilayer analysis | Often limited |
| Thickness Range | 50nm–40μm | Depends on method |
| Sample Preparation | Minimal preparation required | Often requires preparation |
| Optical Property Analysis | Supported | Usually unavailable |