SD-900C Ion Sputterer

Product ID:SYZXlzjs016

Price: Please inquire PDF Format
Supply Ability:50 SETS/MON
Port:SHENZHEN
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  • Product Introduction
  • Consulting
  • Model NumberSD-900C
    Brand NameBOYUANWEINA
    Payment TermsTT,PAYPAL
    SD-900C Ion Sputterer
    Introduction:
    SD-900C ion sputtering instrument has a beautiful appearance and exquisite workmanship. It is a multipurpose equipment developed and produced by The Company for SEM users that can not only sputter gold, silver and platinum, but also evaporate carbon films. This machine has the advantages of small size, easy operation and good film forming effect, and can meet the needs of SEM users for sample preparation at any time.
    It is easy to control the pressure and ionization current of the vacuum chamber and select the desired ionized gas when the sputtering instrument works in combination with the internal automatic control circuit to obtain the best coating effect. Equipped with high qualitative vacuum pump
    characteristic:
    1. Simple, economical, reliable and beautiful.
    2. The sputtering current and vacuum chamber pressure can be adjusted to control the coating rate and particle size.
    3. The SETPLASMA manual start button can preset the pressure and sputtering current to avoid unnecessary damage to the film.
    4. Vacuum protection can avoid short circuit caused by low vacuum.
    5. At the same time, different target materials (gold, platinum, iridium, silver, etc.) can be replaced to achieve a finer particle coating.
    6. A cleaner coating is achieved by introducing different inert gases.
    7. Separate sputtering, evaporation upper cover and glass chamber prevent cross contamination.
    8. All in one machine is more economical.
    9. Carbon fiber rope is more delicate, uniform and fast, which is more conducive to the analysis of material structure.
    10. The sputtering evaporation function is convenient and fast.
    Technical parameters:
    Instrument size: 300 mm for mainframe × 360mm × 380mmW × D × H
    Steam plating 300mm × 360mm × 160mmW × D × H
    Vacuum sample chamber: borosilicate glass 160mm × 110mmD × H
    Target (upper electrode): 50mm × 0.1mmD × H
    Sputtering target: Au
    Sputtering target size: φ 50mm
    Sample table: 50mm (D)
    Sputtering working voltage: 0-1600V (DC) adjustable
    Sputtering current: 0-50mA
    Sputtering timing: 0-360S
    Carbon evaporation current 0-100A (AC)
    Evaporating material: carbon fiber
    Evaporation working voltage: 0-30V
    Evaporation time: 0-1S
    Micro vacuum valve: connectable φ 3mm hose
    Gas can be introduced: various
    Vacuum pump: 2L mechanical rotary pump (domestic VRD-8)
  • Introduction:
    SD-900C ion sputtering instrument has a beautiful appearance and exquisite workmanship. It is a multipurpose equipment developed and produced by The Company for SEM users that can not only sputter gold, silver and platinum, but also evaporate carbon films. This machine has the advantages of small size, easy operation and good film forming effect, and can meet the needs of SEM users for sample preparation at any time.
    It is easy to control the pressure and ionization current of the vacuum chamber and select the desired ionized gas when the sputtering instrument works in combination with the internal automatic control circuit to obtain the best coating effect. Equipped with high qualitative vacuum pump
     
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