SD-650MHT Dual Target Magnetron Sputtering Instrument Introduction: The SD-650MHT dual target magnetron sputtering instrument can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc. Compared with similar devices, it is not only widely used, but also has the advantage of being small in size and easy to operate, making it an ideal equipment for laboratory preparation of material films. Technical Specifications: Instrument host size: length 610mm x width 420mm x height 220mm (note: total height including cavity 490mm) Target head: Magnetron dual target, equipped with a baffle structure. Sputtering equipment for strong magnetic materials. Target head working mode: Each target can work independently/together, using a magnetron target to sputter coating from top to bottom; Target size: diameter 50mm Target material: Standard configuration includes two copper targets with a diameter of 50mm × 3mm Vacuum system: molecular pump+direct coupled high-speed rotary vane vacuum pump, shock resistant turbo molecular pump, pumping speed of 300L/s Pre stage mechanical pump: pumping speed of 4L/s, equipped with anti backflow solenoid valve and oil pollution filter Vacuum measurement: using a composite vacuum gauge to monitor vacuum Ultimate vacuum degree: 5 × 10-5Pa Electrical cabinet: Standard DC constant current power supply: Input voltage: 220V Output voltage: 0-600V Output current: 0-1.6A RF power supply: power of 300W, equipped with RF matching device. Sample stage: Customized sample stage, suitable for special samples Working gas: Ar and other inert gases (requires self provided gas cylinder and pressure reducing valve) Gas path: The gas path can be controlled through the linkage between the electromagnetic flow valve touch screen and the manual valve Water cooling: self circulating cooling water machine Power supply voltage: 380V/220V Control method: Configure VPI customized LCD control system, which can achieve dual screen control. Intelligent control system operation, controlling current and voltage, etc. Starting power: 3KW
Introduction: The SD-650MHT dual target magnetron sputtering instrument can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, polytetrafluoroethylene thin films, etc. Compared with similar devices, it is not only widely used, but also has the advantage of being small in size and easy to operate, making it an ideal equipment for laboratory preparation of material films.
