RTP-3-08 Self standing 8-inch Rapid Annealing Furnace Introduction: RTP-3-08 self-supporting 8-inch rapid annealing furnace is used for: rapid heat treatment; Rapid thermal annealing; Rapid thermal oxidation; Rapid thermal nitriding); Silicification; Diffusion; Compound semiconductor annealing; Annealing after ion implantation; Alloy furnace/electrode alloying; Crystallization and densification; Alloy melting point analysis; Thin film deposition; Solar cell bonding; Technical features: 1. Measurable large-sized samples: The size of single crystal samples that can be measured is 1-8 inches. 2. Innovative design of pressure control system: high-precision control of pressure to meet different process requirements. 3. Storage heat treatment process: facilitates the retrieval of process parameters, improves experimental efficiency, and allows for data retrieval. 4. Rapid heating: The maximum heating rate can reach 150 ℃/s. 5. Program settings and gas path expansion: It can achieve precise control of different temperature ranges, automatically switch between cooling ranges, and save process menus for easy access. By using MFC to precisely control gas flow, it can support up to 6 gas channels and achieve heat treatment in different atmospheric environments (vacuum, inert atmosphere, oxygen, hydrogen, mixed gas, etc.). 6. Fully automatic intelligent control: It adopts fully automatic intelligent control, including temperature, time, gas flow, vacuum, cooling water, etc., all of which can be automatically controlled. 7. Ultra high safety factor: Adopting triple safety measures of furnace door safety temperature opening protection, temperature controller opening permission protection, and equipment emergency stop safety protection, comprehensively ensuring the safety of equipment use. 8. Partition temperature control: Control heating power in different regions to improve temperature uniformity. Domestic annealing furnace: With independent research and development technology and manufacturing capabilities, it can quickly respond to customer after-sales needs.
Introduction: RTP-3-08 self-supporting 8-inch rapid annealing furnace is used for: rapid heat treatment; Rapid thermal annealing; Rapid thermal oxidation; Rapid thermal nitriding); Silicification; Diffusion; Compound semiconductor annealing; Annealing after ion implantation; Alloy furnace/electrode alloying; Crystallization and densification; Alloy melting point analysis; Thin film deposition; Solar cell bonding;
