RTP-3-01 Desktop 1-inch Rapid Annealing Furnace Introduction: The RTP-3-01 series rapid annealing furnace adopts infrared radiation heating technology, which can achieve rapid heating and cooling of 1-inch (optional 2-inch) samples. At the same time, it is equipped with an ultra high precision temperature control system, which can achieve excellent temperature field uniformity. It plays an important role in the research and production of rapid heat treatment (RTP), rapid annealing (RTA), rapid thermal nitriding (RTN), rapid thermal oxidation (RTO) and metal alloying of materials. Product application: rapid heat treatment; Rapid thermal annealing; Rapid thermal oxidation; Rapid thermal nitriding; Silicification; Diffusion; Compound semiconductor annealing; Annealing after ion implantation; Alloy furnace/electrode alloying; Crystallization and densification; Alloy melting point analysis; Thin film deposition; Solar cell bonding; Technical features: characteristic Rapid heating and cooling: The maximum controllable heating rate can reach 50 ℃/s, and under specific conditions, it can reach 100 ℃/s. Cold wall water cooling design can achieve a larger cooling rate, up to 30 ℃/s under specific conditions. Precise temperature control: Industrial grade temperature controllers are used for PID precise temperature control, with high consistency between the target temperature and the set temperature curve, enabling precise temperature control from room temperature to 1200 ℃. Adapt to various process environments: meet heat treatment requirements under various process atmospheres (nitrogen, argon, etc.). Meanwhile, by selecting a vacuum pump, annealing can be carried out under vacuum conditions, with a maximum vacuum degree of 10-3Pa. Equipped with observation window: Through the observation window, real-time changes in the sample during the heat treatment process can be observed. Meanwhile, in situ testing analysis can be conducted by combining relevant testing methods. Ultra high safety factor: Adopting furnace wall over temperature alarm system and cooling water flow alarm system to comprehensively ensure the safety of instrument use. Domestic annealing furnace: With independent research and development technology and manufacturing capabilities, it can quickly respond to customer after-sales needs.
Introduction: The RTP-3-01 series rapid annealing furnace adopts infrared radiation heating technology, which can achieve rapid heating and cooling of 1-inch (optional 2-inch) samples. At the same time, it is equipped with an ultra high precision temperature control system, which can achieve excellent temperature field uniformity. It plays an important role in the research and production of rapid heat treatment (RTP), rapid annealing (RTA), rapid thermal nitriding (RTN), rapid thermal oxidation (RTO) and metal alloying of materials. Product application: rapid heat treatment; Rapid thermal annealing; Rapid thermal oxidation; Rapid thermal nitriding; Silicification; Diffusion; Compound semiconductor annealing; Annealing after ion implantation; Alloy furnace/electrode alloying; Crystallization and densification; Alloy melting point analysis; Thin film deposition; Solar cell bonding;
