Introduction: The ion sputter is a simple, reliable, and economical coating device based on the principle of DC sputtering. It is suitable for scanning electron microscope (SEM) sample preparation in electron microscope laboratory and non-conductor material experimental electrode production. Technical Parameters: 1. Target (upper electrode): Material: Gold Diameter: 50mm Thickness: 0.1mm Purity: 99.999% 2, vacuum chamber: Diameter: 160mm High: 110mm 3. Sample stage (lower electrode): Sputter area: Diameter: 50mm 4. Working vacuum: 2×10-1—8×10-2 mbar 5. Ion ammeter: Maximum current: 50mA 6. Timer: set a single sputtering time according to sputtering habits 7. The highest voltage: -1600DVC 8. Mechanical pump: 2 litres/sec 9. Studio working medium gas: air or argon 10. Vacuum valve: Argon-specific air inlet and micro-inflator adjustment for connecting φ4×2.5mm hoses
Introduction: The ion sputter is a simple, reliable, and economical coating device based on the principle of DC sputtering. It is suitable for scanning electron microscope (SEM) sample preparation in electron microscope laboratory and non-conductor material experimental electrode production.
