Introduction: The imported brand high-performance rotary vane pump produces a clean vacuum pressure of <5*10-1 Pa, which is usually less than 3-5 minutes. High quality constant power magnetron sputtering power supply ensures constant deposition rate. The use of a magnetron cathode also effectively reduces the plasma thermal impact on the sample and ion bombardment damage. It is particularly suitable for the use of gold spray for pursuing higher resolution SEM scanning electron microscopy. Touch screen control, plug and play. Technical Parameters Pump set: Pfeiffer Duo 1.6 or UK Edwards E2M1.5 rotary vane pump Pumping speed: >1.5 m3/h Ultimate vacuum: <4*10'3Torr/ 5*1 O'1 Pa Evacuation time: <3-5 Min Vacuum gauge: imported brand Pirani vacuum gauge Sample chamber size: ~0 150 *110 mm on hot glass Magnetron cut radiation source: Target size 0 50 *0.1-2 _ Sputtering Power Supply: Constant Power Magnetron DC Sputtering Power Max. 30W Sputtering time: programmable Automatic control: Supports automatic scheduling of menu reservations Operation method: Touch screen control Weight: ~20 kg Size: ~420 mm long *300 mm wide *400 mm high Power supply: 22〇VAC, 5〇/60Hz grounded three-pin plug Power Consumption: <500 W Cooling method: air-cooled Quality Assurance: One Year Free/Lifetime Maintenance
Introduction:
The imported brand high-performance rotary vane pump produces a clean vacuum pressure of <5*10-1 Pa, which is usually less than 3-5 minutes. High quality constant power magnetron sputtering power supply ensures constant deposition rate. The use of a magnetron cathode also effectively reduces the plasma thermal impact on the sample and ion bombardment damage. It is particularly suitable for the use of gold spray for pursuing higher resolution SEM scanning electron microscopy. Touch screen control, plug and play.
