ETD-650M magnetron sputtering instrument Introduction: ETD-650M magnetron sputtering instrument is a kind of economical and practical pocket high vacuum magnetron sputtering equipment developed by our company, which is more suitable for the medium test requirements of laboratories in scientific research and education institutions. The system is mainly composed of sputtering vacuum chamber, permanent magnet magnetron sputtering target (strong / weak magnetic target), optical fiber rotary table (customized), DC power supply, working gas circuit, pumping system, circulating water system, film thickness monitoring system, vacuum measurement, electric control system and installation machine. Vacuum system: turbo molecular pump, pumping speed is 300L / s, front stage mechanical pump: pumping speed is 4L / s, with oil return prevention solenoid valve and oil filter vacuum measurement: use composite vacuum gauge to monitor vacuum Purpose: 1. Electron beam sensitive samples It mainly includes biological samples, plastic samples, etc. The electron beam in SEM has high energy. During the interaction with the sample, it transfers part of the energy to the sample in the form of heat. If the sample is sensitive to electron beam, the interaction will destroy part or even the whole sample structure. In this case, the surface coating prepared by a non electron beam sensitive material can act as a protective layer to prevent such damage; 2. Non conductive sample Because the sample is not conductive, there is an "electron trap" on the surface of the sample, and the accumulation of electrons on the surface is called "charging". In order to eliminate the charging effect, a layer of metal conductive layer can be plated on the surface of the sample. As a conductive channel, the charged electrons are transferred from the surface of the material to eliminate the charging effect. In scanning electron microscopy (SEM) imaging, sputtered materials increase the signal-to-noise ratio (SNR) to obtain better image quality. 3. New materials Observation of conductive properties of non-conductive material experimental electrode Technical parameters: Ejecting gas: argon, nitrogen and other gases can be added according to the purpose of the experiment. Sputtering target: the standard target material is gold target with a thickness of 50mm * 0.1mm. Silver target and platinum target can also be equipped according to the actual situation. The evaporation material is carbon rope. Limit vacuum: better than 5 * 10-4Pa Sputtering current: 0-500ma Sample bin size: 180mm in diameter and 200mm in height Sample table size: sample table optical fiber turntable (customizable) Working voltage: 220 V (110V),50Hz
Introduction: ETD-650M magnetron sputtering instrument is a kind of economical and practical pocket high vacuum magnetron sputtering equipment developed by our company, which is more suitable for the medium test requirements of laboratories in scientific research and education institutions. The system is mainly composed of sputtering vacuum chamber, permanent magnet magnetron sputtering target (strong / weak magnetic target), optical fiber rotary table (customized), DC power supply, working gas circuit, pumping system, circulating water system, film thickness monitoring system, vacuum measurement, electric control system and installation machine. Vacuum system: turbo molecular pump, pumping speed is 300L / s, front stage mechanical pump: pumping speed is 4L / s, with oil return prevention solenoid valve and oil filter vacuum measurement: use composite vacuum gauge to monitor vacuum
