ETD-2000MH Magnetron Sputtering Coater

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ETD-2000MH Magnetron Sputtering Coater

Product ID：SYZXlzjs014

Price: Please inquire PDF Format

Supply Ability:50 SETS/MON

Port:SHENZHEN

Product Introduction
Other information

Model NumberETD-2000MH

Brand NameBOYUANWEINA

Payment TermsTT，PAYPAL，Alibaba.com Pay

ETD-2000MH Magnetron Sputtering Coater
Product Introduction
ETD-2000MH Magnetron Sputtering Coater is a high-performance vacuum coating system designed for scanning electron microscope (SEM) sample preparation, conductive coating, and thin film deposition applications. The instrument uses advanced magnetron sputtering technology to deposit uniform metal films on sample surfaces, improving electrical conductivity, reducing charging effects, and enhancing SEM imaging quality.
The system is widely used for coating biological samples, polymer materials, non-conductive specimens, new materials, and research samples. Standard configuration includes a gold sputtering target, with optional silver, platinum, and other metal targets available according to application requirements.

Working Principle
Magnetron sputtering is a physical vapor deposition (PVD) process based on plasma discharge technology.
During operation, electrons accelerated by the electric field collide with argon atoms, causing ionization and generating argon ions (Ar⁺) and secondary electrons. Under the influence of the electric field, Ar⁺ ions accelerate toward the negatively charged target and bombard the target surface with high energy.
The collision process transfers momentum from argon ions to target atoms, causing target atoms or molecules to be ejected from the target surface. These sputtered particles travel through the vacuum chamber and deposit onto the sample surface, forming a thin and uniform coating layer.
The magnetic field generated near the target surface forces secondary electrons to move along an E×B drift path, increasing electron travel distance and ionization efficiency. This creates a high-density plasma region near the target, improving sputtering efficiency while maintaining low sample temperature.

Performance Features
• High-quality magnetron sputtering technology for uniform metal coating deposition
• Suitable for SEM sample preparation and material surface modification
• Effective reduction of charging effects on non-conductive samples
• Improves SEM image resolution, contrast, and signal-to-noise ratio
• Low substrate temperature rise, suitable for heat-sensitive samples
• Compact vacuum chamber design for laboratory research applications
• Standard gold target configuration with optional silver and platinum targets
• High sputtering efficiency with stable plasma generation
• Compatible with various sample types including biological materials, polymers, ceramics, and advanced materials

Main Applications
1. Electron Beam Sensitive Sample Coating
SEM electron beams carry high energy and may damage sensitive samples through thermal effects during imaging.
ETD-2000MH deposits a protective conductive metal coating layer on sample surfaces, reducing electron beam damage and preserving sample structure.
Typical samples include:
• Biological specimens
• Polymer materials
• Soft materials
• Electron-sensitive samples

2. Non-Conductive Sample Preparation
Non-conductive materials can accumulate electrons during SEM observation, causing charging effects that reduce image quality.
The sputtered metal coating provides a conductive pathway to remove accumulated electrons and significantly improves SEM imaging performance.
Applicable materials include:
• Ceramics
• Glass
• Plastics
• Oxides
• Composite materials

3. New Material Research
The system is also suitable for preparing conductive coatings and experimental electrodes for new material research.
Applications include:
• Functional material development
• Thin film research
• Electrode fabrication
• Surface modification studies

Technical Parameters

Parameter	Specification
Product Model	ETD-2000MH
Equipment Type	Magnetron Sputtering Coater
Vacuum Pump	Turbo molecular pump (80 L/s pumping speed) + 2 L rotary vane vacuum pump
Standard Target Material	Gold target
Target Size	Diameter 60 mm × Thickness 0.1 mm
Optional Targets	Silver target, Platinum target, and other metal targets
Sputtering Current	0–500 A
Ultimate Vacuum	5 × 10 Pa
Sample Chamber Size	Diameter 180 mm × Height 200 mm
Sample Stage Size	Diameter 80 mm
Power Supply	220 V, 50 Hz (110 V optional)

Advantages Compared with Traditional Vacuum Coating Systems

Feature	ETD-2000MH Magnetron Sputtering Coater	Traditional Vacuum Evaporation Coater
Coating Method	Plasma magnetron sputtering	Thermal evaporation
Film Uniformity	High uniformity and strong adhesion	Depends strongly on evaporation direction
Sample Temperature	Low temperature rise	Higher thermal impact
Material Compatibility	Suitable for various metals	Limited by evaporation characteristics
SEM Sample Preparation	Excellent	Moderate
Conductive Coating Quality	High-density metal film	May have weaker adhesion

Typical Applications
ETD-2000MH Magnetron Sputtering Coater is widely applied in:
• Scanning electron microscopy (SEM) laboratories
• Universities and research institutes
• Materials science research
• Nanotechnology laboratories
• Semiconductor research
• Biology and biomedical analysis
• Polymer and composite material studies
• Surface engineering research

Frequently Asked Questions (FAQ)
1. What is a magnetron sputtering coater used for?
A magnetron sputtering coater is mainly used to deposit thin metal films on sample surfaces. It is commonly used for SEM sample preparation, conductive coating, and material surface modification.
2. Why are SEM samples coated before observation?
Many SEM samples, especially biological and non-conductive materials, cannot conduct electrons effectively. Metal coating eliminates charging effects, improves image clarity, and protects sensitive samples from electron beam damage.
3. What coating materials can ETD-2000MH use?
The standard configuration uses a gold target. Silver, platinum, and other metal targets can also be installed according to experimental requirements.
4. Is ETD-2000MH suitable for biological samples?
Yes. The low-temperature sputtering process minimizes thermal damage and is suitable for biological specimens and electron-sensitive materials.
5. How should I choose between gold, silver, and platinum coating?
Gold coating is widely used for general SEM imaging. Silver provides excellent conductivity and is suitable for high-resolution applications. Platinum coating is often selected for fine surface structures and nanomaterial observation.
6. What factors should be considered when purchasing a sputtering coater?
Users should consider vacuum performance, target compatibility, sputtering stability, chamber size, sample requirements, and future application expansion needs.

Product Summary
ETD-2000MH Magnetron Sputtering Coater provides a reliable solution for SEM sample preparation and thin film coating. With stable plasma generation, efficient sputtering performance, low-temperature operation, and flexible target options, it is an ideal laboratory instrument for material science, nanotechnology, biology, and advanced research applications.

Frequently Asked Questions (FAQ)
1. What is a magnetron sputtering coater used for?
A magnetron sputtering coater is mainly used to deposit thin metal films on sample surfaces. It is commonly used for SEM sample preparation, conductive coating, and material surface modification.
2. Why are SEM samples coated before observation?
Many SEM samples, especially biological and non-conductive materials, cannot conduct electrons effectively. Metal coating eliminates charging effects, improves image clarity, and protects sensitive samples from electron beam damage.
3. What coating materials can ETD-2000MH use?
The standard configuration uses a gold target. Silver, platinum, and other metal targets can also be installed according to experimental requirements.
4. Is ETD-2000MH suitable for biological samples?
Yes. The low-temperature sputtering process minimizes thermal damage and is suitable for biological specimens and electron-sensitive materials.
5. How should I choose between gold, silver, and platinum coating?
Gold coating is widely used for general SEM imaging. Silver provides excellent conductivity and is suitable for high-resolution applications. Platinum coating is often selected for fine surface structures and nanomaterial observation.
6. What factors should be considered when purchasing a sputtering coater?
Users should consider vacuum performance, target compatibility, sputtering stability, chamber size, sample requirements, and future application expansion needs.