ETD-2000C Sputtering Carbonizer Introduction: The ETD-2000C ion sputtering instrument adds a thermal evaporation accessory on the basis of the ETD-2000 ion sputtering instrument, which can evaporate carbon filaments and has two functions: sputtering and evaporation. Therefore, it has expanded its application scope and is particularly suitable for sample preparation in scanning electron microscopy laboratories. Combining internal automatic control circuits during work makes it easy to control the vacuum chamber pressure, ionization current, and select the required ionized gas to achieve the best coating effect. A multi-purpose device that can both sputter gold, silver, copper, platinum and evaporate carbon films. This machine has the advantages of being small, convenient to operate, simple to operate, and has good film-forming effect, which can meet the needs of SEM users for sample preparation. Features: 1. Simple, economical, and reliable. 2. The sputtering current and vacuum chamber pressure can be adjusted to control the coating rate and particle size. 3. Vacuum protection can prevent equipment short circuits caused by low vacuum. 4. At the same time, different target materials (gold, platinum, iridium, silver, copper, etc.) can be replaced to achieve finer particle coatings. 5. Achieve a purer coating by introducing different inert gases. 6. The digital timer allows for flexible and convenient timing. 7. Carbon fiber rope is more delicate, uniform, and fast, which is more conducive to analyzing material structure Technical Specifications: Instrument size: 305mm × 400mm × 390mm (W × D × H) Vacuum sample chamber: borosilicate glass 160mm × 110mm (D × H) Target (upper electrode): 50mm × 0.1mm (D × H) Sputtering target material: Au (standard), silver target, platinum target, etc. can also be equipped according to the actual situation. Sputtering target size: 50mm in diameter Sample stand: The size of the sample stand can accommodate sample stands with diameters of 50mm and 70mm, and can also be customized according to personal requirements Sputtering working voltage: 0-1600V (DC) adjustable Sputtering current: 0-50mA Sputtering timing: 0-360s Steam carbon current 0-100A (AC) Evaporative material: carbon fiber Operating voltage for evaporation: 0-30V Evaporation time: 0-1S Micro vacuum valve: can be connected to a 3mm hose Gas can be introduced: various types Input voltage: 220V (can be 110V), 50HZ Vacuum pump: 2-liter mechanical rotary pump (domestic VRD-8)
Introduction: The ETD-2000C ion sputtering instrument adds a thermal evaporation accessory on the basis of the ETD-2000 ion sputtering instrument, which can evaporate carbon filaments and has two functions: sputtering and evaporation. Therefore, it has expanded its application scope and is particularly suitable for sample preparation in scanning electron microscopy laboratories. Combining internal automatic control circuits during work makes it easy to control the vacuum chamber pressure, ionization current, and select the required ionized gas to achieve the best coating effect. A multi-purpose device that can both sputter gold, silver, copper, platinum and evaporate carbon films. This machine has the advantages of being small, convenient to operate, simple to operate, and has good film-forming effect, which can meet the needs of SEM users for sample preparation.
